Comparing properties of substrate-constrained and freestanding epitaxial Ni-Mn-Ga films

Acta Materialia

Volumn 58, Issue 9, 2010, Pages 3415-3421

  Backen, Anja ^a,b   Yeduru, Srinivasa R ^c   Kohl, Manfred ^c   Baunack, Stefan ^a   Diestel, Anett ^a,b   Holzapfel, Bernhard ^a   Schultz, Ludwig ^a,b   Fähler, Sebastian ^a  

^a IFW DRESDEN   (Germany)

^b DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^c KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

Epitaxial; Interfaces; Magnetic shape memory alloy; Ni Mn Ga; Thin films

Indexed keywords

EPITAXIAL INTERFACES; ETCHING PROCESS; INTER-DIFFUSION; MAGNETIC SHAPE MEMORY ALLOYS; NI-MN-GA; NI-MN-GA THIN FILMS; ROOM TEMPERATURE; SACRIFICIAL LAYER; TWINNING STRESS; WET-CHEMICAL ETCHING;

CHROMIUM; ETCHING; GALLIUM; GALLIUM ALLOYS; MAGNETIC PROPERTIES; MAGNETIC THICK FILMS; MANGANESE; MANGANESE COMPOUNDS; METALLORGANIC VAPOR PHASE EPITAXY; SHAPE MEMORY EFFECT; STRESS-STRAIN CURVES;

EPITAXIAL FILMS;

EID: 77950082873     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2010.02.016     Document Type: Article

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