Effect of microbubbles on ozonized water for photoresist removal

Journal of Physical Chemistry C

Volumn 116, Issue 23, 2012, Pages 12578-12583

  Takahashi, Masayoshi ^a   Ishikawa, Hiroaki ^b   Asano, Toshiyuki ^b   Horibe, Hideo ^c  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b Industrial Technology Institute of Ibaraki Prefecture   (Japan)

^c KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING METHODS; DISSOLVED OZONE; ENVIRONMENTAL-FRIENDLY; GAS-WATER INTERFACE; HIGH DOSE; HYDROXIDE IONS; HYDROXYL RADICALS; METAL CONTAMINATION; MICRO-BUBBLE; MICROBUBBLES; OZONIZED WATER; PHOTORESIST REMOVAL; REMOVAL RATE; SEMICONDUCTOR MANUFACTURING; WET CHEMICALS;

AMORPHOUS CARBON; OZONE; OZONE LAYER; PHASE INTERFACES; PHOTORESISTS; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS;

DEWATERING;

EID: 84862288781     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp301746g     Document Type: Article

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