Liquid clean formulations for stripping high-dose ion-implanted photoresist from microelectronic devices

Journal of the Electrochemical Society

Volumn 153, Issue 7, 2006, Pages

  Visintin, Pamela M ^a   Korzenski, Michael B ^a,b   Baum, Thomas H ^a  

^a ENTEGRIS INC   (United States)

^b ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

ARSENIC; CARBONIZATION; HARDENING; ION IMPLANTATION; MICROELECTRONICS; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLY;

CLEANING EFFICIENCY; POLYHYDROXYSTYRENE PHOTORESISTS; SILICON-CONTAINING LAYERS; STRUCTURAL INTEGRITY;

PHOTORESISTS;

EID: 33744783987     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2195884     Document Type: Article

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