Substrate temperature dependence of the photoresist removal rate using atomic hydrogen generated by a hot-wire tungsten catalyst

Japanese Journal of Applied Physics

Volumn 49, Issue 1 Part 1, 2010, Pages

  Yamamoto, Masashi ^a   Maruoka, Takeshi ^a   Kono, Akihiko ^a   Horibe, Hideo ^a   Umemoto, Hironobu ^b  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

^b SHIZUOKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

APPARENT ACTIVATION ENERGY; ATOMIC HYDROGEN; CATALYST TEMPERATURE; ENVIRONMENTALLY-FRIENDLY; HYDROGEN MOLECULE; PHOTORESIST REMOVAL; REMOVAL METHOD; SUBSTRATE TEMPERATURE; SUBSTRATE TEMPERATURE DEPENDENCE;

ACTIVATION ENERGY; ARRHENIUS PLOTS; CATALYSTS; HYDROGEN; PHOTORESISTS; TUNGSTEN; WIRE;

ATOMS;

EID: 77950820885     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.49.016701     Document Type: Article

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