Improvement of photoresist removal efficiency in ozonated water cleaning system

Journal of Industrial and Engineering Chemistry

Volumn 14, Issue 1, 2008, Pages 100-104

  Lee, Jonghyuck ^a   Park, Kibyung ^a   Lim, Sangwoo ^a  

^a Yonsei University   (South Korea)

Author keywords

Boundary layer thickness; Ozonated water; Ozone; Photoresist removal

Indexed keywords

EID: 37549009132     PISSN: 1226086X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jiec.2007.07.003     Document Type: Article

References (16)

1. Franssila S. Introduction of Microfabrication (2004), Wiley, West Sussex p. 133
2. Hills G.W., and Cook J.M. In: Nishi Y., and Doering R. (Eds). Handbook of Semiconductor Manufacturing Technology (2000), Marcel Dekker, New York 655
3. Clews P.J., Nelson G.C., Matlock C.A., Resnick P.J., Adkins C.L.J., and Korbe N.C. In: Ruzyllo J., and Novak R.E. (Eds). Proceedings of the 4th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing (1996), The Electrochemical Society Inc., New Jersey
4. Noda S., Kawase K., Horibe H., Kuzumoto M., and Kataoka T. J. Electrochem. Soc. 152 G73 (2005)
5. Siddiqui M.S., Amy G.L., and Murphy B.D. Water Res. 31 3098 (1997)
6. Meunier L., Canonica S., and von Gunten U. Water Res. 40 864 (2006)
7. Wolf S., and Tauber R.N. Silicon Processing for the VLSI Era, vol. 1. Process Technology. 2nd ed. (2000), Lattice Press, California p. 500
8. Noda S., Miyamoto M., Horibe H., Oya I., Kuzumoto M., and Kataoka T. Proceedings of the Semiconductor Manufacturing Symposium 2001 of IEEE International. IEEE, San Jose (2001) 233
9. DeGendt S., Wauters J., and Heyns M. Solid State Technol. 41 57 (1998)
10. Bablon G., Bellamy W.D., Bourbigot M.-M., Daniel F.B., Doré M., Erb F., Gordon G., Langlais B., Laplanche A., Legube B., Martin G., Masschelein W.J., Pacey G., Reckhow D.A., and Ventresque C. In: Langlais B., Rechhow D.A., and Brink D.R. (Eds). Ozone in Water Treatment: Application and Engineering (1991), Lewis Publishers, Chelsea 12
11. DeGendt S., Snee P., Cornelissen I., Lux M., Vos R., Mertens P.W., Knotter D.M., Meuris M.M., and Heyns M. Solid State Phenom. 65 165 (1999)
12. Nelson S. Solid State Technol. 42 107 (1999)
13. Hart E.J., Sehested K., and Holcman J. Anal. Chem. 55 46 (1983)
14. Pavia D.L., Lampman G.M., and Kriz G.S. Introduction to Spectroscopy. 3rd ed. (2001), Brooks/Cole, Ontario p. 13
15. Rischbieter E., Stein H., and Schumpe A. J. Chem. Eng. Data 45 338 (2000)
16. Hinds W.C. Aerosol Technology. 2nd ed. (1999), Wiley-Interscience Publication, New York p. 141