Development of a method for resist removal by ozone with acetic acid vapor

Journal of the Electrochemical Society

Volumn 152, Issue 1, 2005, Pages

  Noda, Seiji ^a   Kawase, Kazumasa ^a   Horibe, Hideo ^a   Kuzumoto, Masaki ^a   Kataoka, Tatsuo ^b  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

^b SPC Electronics Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACETIC ACID; ACTIVATION ENERGY; ALUMINUM; CORROSION; DIFFUSION; ELECTROCHEMICAL ELECTRODES; ENTHALPY; MOLYBDENUM; OXIDATION; OZONE; OZONIZATION; SOLUBILITY; VAPORS;

ACETIC ACID VAPORS; OXIDATION RATE; OZONE TREATMENT; RESIST REMOVAL;

PHOTORESISTS;

EID: 12744279472     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1833311     Document Type: Article

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