Photoresist stripping by ozone/water processes: Effect of additives

Solid State Phenomena

Volumn 103-104, Issue , 2005, Pages 309-314

  Vankerckhoven, H ^a   De Smedt, F ^a   Vandersmissen, K ^a   Claes, M ^b   De Gendt, S ^b   Heyns, M M ^b   Vinckier, C ^a  

^a UNIVERSITY OF LEUVEN   (Belgium)

^b MEC   (Belgium)

Author keywords

Additives; Ozone; Photoresist; Water

Indexed keywords

EID: 36048958553     PISSN: 10120394     EISSN: 16629779     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.103-104.309     Document Type: Conference Paper

References (7)

1. S. De Gendt, M. Lux, M. Claes, J. Van Hoeymissen, et al. in Electrochemical Society Proceedings, edited by R.E. Novak, J. Ruzyllo and T. Hattori (ECS 1999), 99-36, 391-398.
2. E. Bergman, M. Melli, and M. Magrin in Electrochemical Society Proceedings, edited by R.E. Novak, J. Ruzyllo and T. Hattori (ECS, 1999), 99-36, 399-406.
3. R.E. Bühler, J. Staehelin, and J. Hoigné, J. Phys. Chem. 88, 2560 (1984).
4. J. Staehelin and J. Hoigné, Environ. Sci. Technol. 19, 1206 (1985).
5. J. Staehelin and J. Hoigné, Environ. Sci. Technol. 16, 676 (1982).
6. H. Vankerckhoven, F. De Smedt, M. Claes, S. De Gendt, M. Heyns, and C. Vinckier, Solid State Phenomena 92, 101 (2003).
7. H. Vankerckhoven, Ph. D. thesis, K.U.Leuven, 2004.