Removal characteristics of resists having different chemical structures by using ozone and water

Japanese Journal of Applied Physics

Volumn 48, Issue 2, 2009, Pages

  Horibe, Hideo ^a,c   Yamamoto, Masashi ^a   Goto, Yousuke ^a   Miura, Toshiinori ^b   Tagawa, Seiichi ^c  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

^b MEIDENSHA CORPORATION   (Japan)

^c OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; DEWATERING; KRYPTON; OZONE; RESINS;

A CARBONS; ARF RESISTS; BASE POLYMERS; CHEMICAL STRUCTURES; ENVIRONMENTALLY-FRIENDLY; ION SPECIES; MAIN CHAINS; NOVOLAK; NOVOLAK RESINS; NOVOLAK RESISTS; REMOVAL RATES; RESIST REMOVALS;

IONS;

EID: 60849135125     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.48.026505     Document Type: Article

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