Development of a Photoresist Removal Method Using Ozone Gas with Water Vapor for LCD Manufacturing

Journal of the Electrochemical Society

Volumn 150, Issue 9, 2003, Pages

  Noda, Seiji ^a   Miyamoto, Makoto ^a   Horibe, Hideo ^a   Oya, Izumi ^a   Kuzumoto, Masaki ^a   Kataoka, Tatsuo ^b  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

^b SPC Electronics Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION IN GASES; DRY ETCHING; LIQUID CRYSTAL DISPLAYS; OXIDATION; OZONE WATER TREATMENT; PHOTORESISTS; SUBSTRATES; THIN FILM TRANSISTORS;

DIFFUSION RATE;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0041779940     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1593654     Document Type: Article

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