Physics and engineering of crossed-field discharge devices

Plasma Sources Science and Technology

Volumn 21, Issue 3, 2012, Pages

  Abolmasov, S N ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITIONAL CONTROL; ANODE LAYERS; CROSSED ELECTRIC AND MAGNETIC FIELDS; DISCHARGE PARAMETERS; ELECTRON CONFINEMENT; GAS PRESSURES; INVERTED MAGNETRONS; LOW PRESSURES; PLANAR MAGNETRON; POSSIBLE FUTURES; PURE-ELECTRON PLASMAS; TRANSIT TIME;

ELECTROMAGNETIC FIELDS; ION SOURCES; MAGNETIC FIELDS; PLASMA CONFINEMENT;

ELECTRIC DISCHARGES;

EID: 84862206095     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/21/3/035006     Document Type: Review

References (116)

1. Phillips C E S 1898 Proc. R. Soc. (Lond.) 64 172
2. Penning F M 1936 Physica (Amsterdam) 3 873
3. Penning F M 1937 Physica (Amsterdam) 4 71
4. Penning F M and Nienhius K 1949 Philips Tech. Rev. 11 116
5. Hall L D 1958 Rev. Sci. Instrum. 29 367
6. Hobson J P and Redhead P A 1958 Can. J. Phys. 36 271
7. Redhead P A 1959 Can. J. Phys. 37 1260
8. Goebel D M and Katz I 2008 Fundamentals of Electric Propulsion: Ion and Hall Thrusters (JPL Space Science and Technology Series) (New York: Wiley) p 325
9. Grishin S D, Leskov L V and Kozlov N P 1983 Plasma Accelerators (Moscow: Mashinostroenie) (in Russian)
10. Zhurin V V, Kaufman R H and Robinson R S 1999 Plasma Sources Sci. Technol. 8 R1
11. General Plasma Inc. 2008 Classic Gridless Ion Beam Sources http://www.generalplasma.com/
12. Veeco 2009 Gridless Anode Layer Ion Sources. http:/www.veeco.com/
13. Dudnikov V and Westner A 2002 Rev. Sci. Instrum. 73 729 (Pubitemid 34192634)
14. Sasaki N et al 2006 ULVAC Tech. J. E 63 27 (English)
15. Clarke P J 1968 Sputtering apparatus US Patent #3,616,450
16. Corbani J F 1973 Cathode sputtering apparatus US Patent #3,878,085
17. Chapin J S 1974 Sputtering process and apparatus US Patent #4,166,018
18. Chapin J S 1974 IBM J. Res. Dev. 25 37
19. Kukla R 1997 Surf. Coat. Technol. 93 1
20. Kelly P J and Arnell A D 2000 Vacuum 56 159 (Pubitemid 30564470)
21. Hopwood J A 2000 Thin Films: Ionized Physical Vapour Deposition vol 27 (San Diego, CA: Academic)
22. Chapman B 1980 Glow Discharge Processes (New York: Wiley) chapter 5
23. Thornton J A and Penfold A 1987 Thin Film Processes ed J L Vossen and W Kern (New York: Academic) p 76
24. Wasa K and Hayakawa S 1992 Handbook of Sputter Deposition Technology: Principles, Technology, and Applications (Park Ridge, IL: Noyes Publications) p 90
25. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley) chapter 14
26. Rossnagel S M 2002 Handbook of Thin-Film Deposition Processes and Techniques: Principles, Methods, Equipment and Applications 2nd edn ed K Seshan (Park Ridge, IL: Noyes Publications) chapter 8
27. Chen F F 1984 Introduction to Plasma Physics and Controlled Fusion vol 1 2nd edn (New York: Plenum) chapter 2
28. Raizer Yu P 1997 Gas Discharge Physics (Berlin: Springer) chapter 4
29. Raizer Yu P 1997 Gas Discharge Physics (Berlin: Springer) chapter 7
30. Schuurman W 1967 Physica (Amsterdam) 36 136
31. Wolf B 1995 Handbook of Ion Sources (Boca Raton, FL: CRC Press) p 69
32. Müller A and Salzborn E 1977 Phys. Lett. A 62 391
33. Loeb H W 2005 Plasma Phys. Control. Fusion 47 B565
34. Dudnikov V 2002 Rev. Sci. Instrum. 73 992 (Pubitemid 34192723)
35. Anders A, MacGill R A, Brown I G and Vizir A 1998 Rev. Sci. Instrum. 69 880
36. Abolmasov S N, Bizyukov A A, Kawai Y, Kashaba A Y, Maslov V I and Sereda K N 2002 Japan. J. Appl. Phys. Part 1 41 5415
37. Forrester A T 1998 Large Ion Beams: Fundamentals of Generation and Propagation (New York: Wiley)
38. Child C D 1911 Phys. Rev. 32 492
39. Langmuir I and Compton K T 1931 Rev. Mod. Phys. 3 251
40. Abolmasov S N and Samukawa S 2007 Rev. Sci. Instrum. 78 073302 (Pubitemid 47192242)
41. Major F G, Gheorghe V N and Werth G 2005 Charged Particle Traps: Physics and Techniques of Charged Particle Field Confinement (Berlin: Springer) p 51
42. Glocker D A, Romach M M and Lindberg V W 2001 Surf. Coat. Technol. 146147 457 (Pubitemid 34018630)
43. Anders A 2005 Surf. Coat. Technol. 200 1893 (Pubitemid 41781427)
44. Kaufman H R, Robinson R S and Seddan R I 1987 J. Vac. Sci. Technol. A 5 2081
45. Kaufman H R and Robinson R S 1990 Handbook of Plasma Processing Technology: Fundamentals, Etching, Deposition and Surface Interactions ed S M Rossnagel (Park Ridge, IL: Noyes Publications) chapter 7
46. Abolmasov S N 2003 PhD Thesis Kyushu University, Fukuoka
47. Maniv S and Westwood W D 1980 J. Vac. Sci. Technol. 17 743 (Pubitemid 11425936)
48. Rossnagel S M and Kaufman H R 1987 J. Vac. Sci. Technol. A 5 2276
49. Wendt A E and Lieberman M A 1990 J. Vac. Sci. Technol. A 8 902
50. McKelvey H E 1982 Magnetron cathode sputtering apparatus US Patent
51. Window B and Savvides N 1986 J. Vac. Sci. Technol. A 4 196
52. Savvides N and Window B 1986 J. Vac. Sci. Technol. A 4 504
53. Vlček J, Pajdarová A D and Musil J 2004 Contrib. Plasma Phys. 44 426 (Pubitemid 39378867)
54. Rossnagel S M and Hopwood J 1993 Appl. Phys. Lett. 63 3285
55. Musil J, Kadlec S and Münz W D 1991 J. Vac. Sci. Technol. A 9 1171
56. Yoshida Y 1996 Plasma Sources Sci. Technol. 5 275
57. Xu J, Deng X, Zhang J, Lu W and Ma T 2001 Thin Solid Films 390 107 (Pubitemid 32543807)
58. Yonesu A, Takemoto H, Hirata Y and Yamashiro Y 2002 Vacuum 66 275 (Pubitemid 34862420)
59. Kouznetsov V, Macák K, Schneider J M, Helmersson U and Petrov I 1999 Surf. Coat. Technol. 122 290
60. Helmersson U, Latterman M, Bohlmark J, Ehiasarian A P and Gudmundsson J T 2006 Thin Solid Films 513 1 (Pubitemid 44202356)
61. Ehiasarian A P, New R, Münz W D, Hultman L, Helmersson U and Kouznetsov V 2002 Vacuum 65 147 (Pubitemid 34284160)
62. Mahan J E and Vantomme A 2000 Phys. Rev. B 61 8516
63. Hooper E G 1969 Adv. Electron. Electron Phys. 27 295
64. Redhead P A, Hobson J P and Kornelsen E V 1993 The Physical Basis of Ultrahigh Vacuum (New York: AVS Classics in Vacuum Science and Technology/American Institute of Physics) chapter 8.2
65. Kervalishvili N A and Zharinov V A 1966 Sov. Phys. - Tech. Phys. 10 1682
66. Vlasov M A, Zharinov A V and Kovalenko Yu A 2001 Sov. Phys. - Tech. Phys. 46 1522
67. Kovalenko A Yu, Kovalenko Yu A and Keidar M 2006 Appl. Phys. Lett. 89 051503 (Pubitemid 44350218)
68. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley) p 469
69. Wasa K and Hayakawa S 1965 J. Phys. Soc. Japan 20 1219
70. Reykhrudel E M, Smirnitskaya G M and Sheretov E P 1962 Radiotekh. Elektron. 7 1809 (in Russian)
71. Poulter K F 1972 J. Phys. E: Sci. Instrum. 5 267
72. Babertsyan R P, Badalyan E S, Egiazaryan G A and Ter-Gevorkyan I E 1998 Sov. Phys. - Tech. Phys. 43 1035
73. Redhead P A 1965 Can. J. Phys. 43 1001
74. Redhead P A 1988 Vacuum 38 901
75. Davidson R C 1990 Physics of Nonneutral Plasmas (Reading, MA: Addison-Wesley) p 289
76. Driscoll C F and Malmberg J H 1983 Phys. Rev. Lett. 50 167
77. Kervalishvili N A 1989 Sov. J. Plasma Phys. 15 98
78. Kervalishvili N A 1989 Sov. J. Plasma Phys. 15 436
79. Kervalishvili N A 1991 Phys. Lett. A 157 391
80. Kervalishvili G N, Javakhishvili J I and Kervalishvili N A 2002 Phys. Lett. A 296 289
81. Kervalishvili N A and Kortkhondziya V P 1974 Sov. Phys. - Tech. Phys. 18 1203
82. Hobson J P and Redhead P A 1958 Can. J. Phys. 36 217
83. Kaganskii M G, Kaminskii D L and Klyucharev A N 1964 Sov. Phys. - Tech. Phys. 9 815
84. Abolmasov S N, Bizyukov A A, Kashaba A Y and Sereda K N 1999 Vestn. Kharkovskogo Univ., Fizi. Ser.: Yadra, Chastitsy, Polya 4 55 (in Russian)
85. Abolmasov S N, Samukawa S and Bizyukov A A 2007 Phys. Plasmas 14 093501 (Pubitemid 47509158)
86. Rossnagel S M and Kaufman H R 1987 J. Vac. Sci. Technol. A 5 88
87. Krall N A and Trivelpiece A W 1986 Principles of Plasma Physics (San Francisco, CA: San Francisco Press)
88. Sheridan T E and Goree J 1989 J. Vac. Sci. Technol. A 7 1014
89. Lundin D, Helmersson U, Kirkpatrick S, Rohde S and Brenning N 2008 Plasma Sources Sci. Technol. 17 025007
90. Bradley J W, Thompson S and Gonzalvo Y A 2001 Plasma Sources Sci. Technol. 10 490 (Pubitemid 32841194)
91. Vetushka A and Btadley J W 2007 J. Phys. D: Appl. Phys. 40 2037 (Pubitemid 46453790)
92. Bohlmark J, Helmersson U, VanZeeland M, Axnäs I, Alami J and Brenning N 2004 Plasma Sources Sci. Technol. 13 654
93. Haas J M and Gallimore A D 2002 IEEE Trans. Plasma Sci. 30 687 (Pubitemid 34975150)
94. Peterson P Y, Gallimore A D and Haas J M 2002 Phys. Plasmas 9 4354 (Pubitemid 35312858)
95. Keidar M and Beilis I I 2006 IEEE Trans. Plasma Sci. 34 804
96. Backus J 1949 Characteristics of Electrical Discharges in Magnetic Fields ed A Guthrie and R K Wakerling (New York: McGraw-Hill) chapter 11
97. Bohm D 1949 Characteristics of Electrical Discharges in Magnetic Fields ed A Guthrie and R K Wakerling (New York: McGraw-Hill) chapter 11
98. Knauer W 1962 J. Appl. Phys. 33 2093
99. Sheridan T E, Goeckner M J and Goree J 1990 J. Vac. Sci. Technol. A 8 30
100. Bogaerts A, Bultinck E, Kolev I, Schwaederlé L, Van Aeken K, Buyle G and Depla D 2009 J. Phys. D: Appl. Phys. 42 194018
101. Bogaerts A, Kolev I and Buyle G 2008 Reactive Sputter Deposition ed D Delpa and S Mahieu (Berlin: Springer) chapter 3
102. Kolev I and Bogaerts A 2004 Contrib. Plasma Phys. 44 582 (Pubitemid 40004724)
103. Abolmasov S N and Bizyukov A A 2005 IEEE Trans. Plasma Sci. 33 1447 (Pubitemid 41554533)
104. Fermi F 1949 Phys. Rev. 75 1169
105. Lieberman M A and Godyak V A 1998 IEEE Trans. Plasma Sci. 26 955
106. Ginzburg V L 1970 The Propagation of Electromagnetic Waves in Plasmas 2nd edn (Oxford: Pergamon)
107. Stix Th H 1962 The Theory of Plasma Waves (New York: McGraw-Hill)
108. Vandenplas P E and Messiaen A M 1968 Phys. Lett. A 28 59
109. Golant V E and Krivosheev M V 1969 Sov. Phys. - Tech. Phys. 14 719
110. Lisitano G, Fontanesi M and Sindoni E 1970 Appl. Phys. Lett. 16 122
111. Kopecky V, Musil J and Zacek F 1975 Plasma Phys. 17 1147
112. Musil J 1996 Vacuum 47 145 (Pubitemid 126348596)
113. Brown I G, Galvin J E, Gavin B F and MacGill R A 1985 Rev. Sci. Instrum. 56 1894
114. Yoshida Y, Ohnishi T, Hirofuji Y and Ikeda T 1990 Rev. Sci. Instrum. 61 598
115. Abolmasov S N, Shindo M, von Buttlar M, Muta H, Bizyukov A A and Kawai Y 2003 Surf. Coat. Technol. 174175 142 (Pubitemid 37054257)
116. Abolmasov S N, Muta H and Kawai Y 2004 Vacuum 74 497