Trends in sputter yield data in the film deposition regime

Physical Review B - Condensed Matter and Materials Physics

Volumn 61, Issue 12, 2000, Pages 8516-8525

  Mahan, John E ^a   Vantomme, André ^b  

^a Department of Chemical and Biological Engineering and School of Biomedical Engineering   (United States)

^b KU LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012738351     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.61.8516     Document Type: Article

References (14)

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