Magnetron sputtering on large scale substrates: An overview on the state of the art

Surface and Coatings Technology

Volumn 93, Issue 1, 1997, Pages 1-6

  Kukla, Reiner ^a  

^a EVONIK INDUSTRIES AG   (Germany)

Author keywords

Sputter

Indexed keywords

SPUTTER DEPOSITION; SUBSTRATES;

PLANAR MAGNETRONS;

MAGNETRON SPUTTERING;

EID: 0031200659     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00018-2     Document Type: Article

References (13)

1. F.M. Penning, US-PS 2, 146, 025.
2. J.S. Chapin, US-PS 4, 166, 018.
3. J.L. Vossen, W. Kern, Thin Film Processes II, Academic Press, 1991.
4. K. Wasa, S. Hayakawa, Handbook of Sputter Deposition Technology, Noyes Publications, 1992.
5. R.F. Bunshah, Deposition Technologies for Films and Coatings, Noyes Publications, 1982.
6. B. Chapman, Glow Discharge Processes, Wiley, New York, 1980.
7. F.F. Chen, Introduction To Plasma Physics and Controlled Fusion, Plenum Press, New York and London, 1984.
8. R. Kukla, T. Krug, R. Ludwig, K. Wilmes, A highest rate self-sputtering magnetron source, Vacuum 41 (1990) 1968
9. R. Kukla, M. Bähr, S. Beißwenger, W.E. Fritsche, M. Lubbehusen, High rate sputtering of metals and metal oxides with a moving plasma zone, Thin Solid Films 228 (1993) 51
10. P.B. Barney, "3"C-MAG Sputter deposition source development, in Proc. SVC 33rd Aim. Tech. Conf., 1990, p. 43.
11. 2 for the production of optical compounds, in Proc. SVC 33rd Ann. Tech. Conf., 1990, p. 250.
12. S. Schiller, K. Goedicke, V. Kirchoff, Pulsed technology - a new era of magnetron sputtering, paper presented at the SVC 38th Ann. Tech. Conf., Chicago, 1995.
13. 2 layers onto large scale substrate using an A.C. twin-magnetron cathode, paper presented at the SVC 38th Ann. Tech. Conf., Chicago, 1995.