A new route to fabricate large-area, compact Ag metal mesh films with ordered pores

Langmuir

Volumn 28, Issue 19, 2012, Pages 7476-7483

  Wu, Luo ^a   He, Weiwei ^a   Teng, Dayong ^a   Ji, Shulin ^a   Ye, Changhui ^a  

^a INSTITUTE OF SOLID STATE PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AR PLASMAS; CHEMICAL DEPOSITION METHOD; ETCHING TIME; HIGH QUALITY; METAL MESH; METAL PARTICLE; METAL-ASSISTED CHEMICAL ETCHING; NUCLEATION AND GROWTH; SI NANOWIRE; SINGLE LAYER; TWO-STEP DEPOSITION;

METALS; MICROSPHERES; NANOWIRES; PLASMA ETCHING; POLYSTYRENES;

SILVER;

EID: 84861163284     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la300788r     Document Type: Article

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