Matrix-free laser desorption/ionization mass spectrometry on silicon nanowire arrays prepared by chemical etching of crystalline silicon

Langmuir

Volumn 26, Issue 2, 2010, Pages 1354-1361

  Piret, Gaelle ^a,b   Drobecq, Hervé ^c   Coffmier, Yannick ^a,b   Melnyk, Oleg ^c   Boukherroub, Rabah ^a  

^a CNRS   (France)

^b INSTITUT D ELECTRONIQUE   (France)

^c INSTITUT DE BIOLOGIE DE LILLE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTES; AQUEOUS SOLUTIONS; AVERAGE DIAMETER; BOVINE SERUM ALBUMINS; CHEMICAL ETCHING; CRYSTALLINE SILICONS; DESORPTION/IONIZATION; DISSOLUTION TIME; ETCHANT CONCENTRATIONS; HIGHLY SENSITIVE; LASER DESORPTION/IONIZATION MASS SPECTROMETRIES; MALDI-MS; MATRIX; MATRIX-ASSISTED LASER DESORPTION/IONIZATION MASS SPECTROMETRY; SILICON NANOSTRUCTURES; SILICON NANOWIRE ARRAYS; SILICON NANOWIRES; SINGLE-STEP; SMALL MOLECULES; THERMAL PROPERTIES; TYROSINE KINASE INHIBITOR;

AMINO ACIDS; BODY FLUIDS; CRYSTALLINE MATERIALS; DESORPTION; DISSOLUTION; ETCHING; MASS SPECTROMETERS; MASS SPECTROMETRY; MORPHOLOGY; NANOWIRES; OPTICAL PROPERTIES; PHOSPHATASES; SIGNAL TO NOISE RATIO; SURFACE CHEMISTRY; THERMODYNAMIC PROPERTIES;

SURFACE MORPHOLOGY;

NANOWIRE; SILICON;

ARTICLE; CHEMISTRY; CRYSTALLIZATION; MASS SPECTROMETRY; METHODOLOGY; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CRYSTALLIZATION; MICROSCOPY, ELECTRON, SCANNING; NANOTECHNOLOGY; NANOWIRES; PHOTOELECTRON SPECTROSCOPY; SILICON; SPECTROMETRY, MASS, MATRIX-ASSISTED LASER DESORPTION-IONIZATION;

EID: 74249111373     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la902266x     Document Type: Article

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