Electroless deposition of W-doped Ag films onto p-Si(100) from diluted HF solution

Transactions of Nonferrous Metals Society of China (English Edition)

Volumn 19, Issue 6, 2009, Pages 1474-1478

  YE, Wei chun ^a   MA, Chuan li ^b   WANG, Chun ming ^b   ZHOU, Feng ^a  

^a LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

^b LANZHOU UNIVERSITY   (China)

Author keywords

autocatalytic electroless deposition; HF; silicon; W doped Ag film

Indexed keywords

AG FILMS; ANTI-CORROSION; AUTOCATALYTIC; ELECTROLESS DEPOSITION; HF; HF SOLUTIONS; HYDROGEN-TERMINATED SILICON; MOLAR FRACTIONS; MOLAR RATIO; SEM; SI(1 0 0); SILVER FILM; TUNGSTATE ION;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; DOPING (ADDITIVES); HYDROFLUORIC ACID; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SILVER DEPOSITS; TUNGSTEN; TUNGSTEN COMPOUNDS; TUNGSTEN DEPOSITS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

SILVER;

EID: 72649093302     PISSN: 10036326     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1003-6326(09)60054-6     Document Type: Article

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