Controlled fabrication of silicon nanowires by electron beam lithography and electrochemical size reduction

Nano Letters

Volumn 5, Issue 2, 2005, Pages 275-280

  Juhasz, Robert ^a   Elfström, Niklas ^a   Linnros, Jan ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; ELECTROCHEMISTRY; ELECTROLYTIC POLISHING; ELECTRON BEAM LITHOGRAPHY; ETCHING; MORPHOLOGY; PHOTOLITHOGRAPHY; SILICON;

CHARGED SURFACE STATES; ELECTROCHEMICAL ETCHING; ELECTROCHEMICAL SIZE REDUCTION; SILICON NANOWIRES;

NANOSTRUCTURED MATERIALS;

NANOTUBE; SILICON;

ARTICLE; CHEMISTRY; COMPARATIVE STUDY; CONFORMATION; CRYSTALLIZATION; ELECTROCHEMISTRY; ELECTRON; EVALUATION; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; RADIATION EXPOSURE; ULTRASTRUCTURE;

CRYSTALLIZATION; ELECTROCHEMISTRY; ELECTRONS; MATERIALS TESTING; MOLECULAR CONFORMATION; NANOTECHNOLOGY; NANOTUBES; PARTICLE SIZE; SILICON;

EID: 14644409706     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl0481573     Document Type: Article

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