Multi-technique approach for the evaluation of the crystalline phase of ultrathin high-k gate oxide films

AIP Conference Proceedings

Volumn 1395, Issue , 2011, Pages 154-160

  Bersch, E ^a   LaRose, J D ^a   Wells, I ^a   Consiglio, S ^b   Clark, R D ^b   Leusink, G J ^b   Matyi, R J ^a   Diebold, A C ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b TEL TECHNOLOGY CENTER   (United States)

Author keywords

grazing incidence in plane X ray diffraction; HfO 2; HfO 2 crystalline phase; higher k; spectroscopic ellipsometry; X ray photoelectron spectroscopy

Indexed keywords

EID: 84861075023     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.3657882     Document Type: Conference Paper

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