Near-edge optical absorption behavior of sputter deposited hafnium dioxide

Journal of Applied Physics

Volumn 101, Issue 12, 2007, Pages

  Hoppe, E E ^a,b   Sorbello, R S ^a   Aita, C R ^a,b  

^a UNIVERSITY OF WISCONSIN MILWAUKEE   (United States)

^b University of Wisconsin Milwaukee   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION COEFFICIENT; ENERGY FUNCTIONS; HAFNIUM DIOXIDE; MONOCLINIC TEXTURES;

FILM GROWTH; FUSED SILICA; LIGHT ABSORPTION; SPECTROPHOTOMETRY; SPUTTER DEPOSITION; X RAY DIFFRACTION;

HAFNIUM COMPOUNDS;

EID: 34547437348     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2750406     Document Type: Article

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