Correlation between oxygen stoichiometry, structure, and opto-electrical properties in amorphous In 2O 3:H films

Journal of Applied Physics

Volumn 111, Issue 6, 2012, Pages

  Koida, Takashi ^a   Shibata, Hajime ^a   Kondo, Michio ^a   Tsutsumi, Koichi ^b   Sakaguchi, Akio ^b   Suzuki, Michio ^b   Fujiwara, Hiroyuki ^c  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b J A Woolam Japan Corporation   (Japan)

^c GIFU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS NETWORKS; CARRIER EFFECTIVE MASS; CERAMIC TARGET; FLOW RATIOS; FREE CARRIER ABSORPTION; HALL MEASUREMENTS; IONIZED IMPURITY SCATTERING; MICROSCOPIC STRUCTURES; OPTICAL AND ELECTRICAL PROPERTIES; OXYGEN STOICHIOMETRY; POST-THERMAL ANNEALING; RICH STRUCTURE; ROOM TEMPERATURE; RUTHERFORD BACKSCATTERING SPECTROMETRY; STRUCTURAL CHANGE; TRANSPARENT CONDUCTING FILMS; VISIBLE WAVELENGTHS; VOID STRUCTURES;

CARRIER MOBILITY; DESORPTION; ELECTRIC PROPERTIES; HALL MOBILITY; IONIZATION OF GASES; OXYGEN; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPECTROSCOPIC ELLIPSOMETRY; STOICHIOMETRY; THERMAL DESORPTION SPECTROSCOPY; TRANSPORT PROPERTIES; VAPORS;

AMORPHOUS FILMS;

EID: 84859538719     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3696978     Document Type: Article

References (48)

1. S. Ishibashi, Y. Higuchi, Y. Ohta, and K. Nakamura, J. Vac. Sci. Technol. A 8, 1399 (1990). 10.1116/1.576889
2. Y. Shigesato, Y. Hayashi, and T. Haranoh, Appl. Phys. Lett. 61, 73 (1992). 10.1063/1.107673
3. M. Ando, M. Takabatake, E. Nishimura, F. Leblanc, K. Onisawa, and T. Minemura, J. Non-Cryst. Solids 198-200, 28 (1996). 10.1016/0022-3093(95)00648-6
4. B. H. Lee, I. G. Kim, S. W. Cho, and S.-H. Lee, Thin Solid Films 302, 25 (1997). 10.1016/S0040-6090(96)09581-8
5. A. Kaijo, Display Imaging 4, 143 (1996).
6. T. Minami, T. Kakumu, and S. Takata, J. Vac. Sci. Technol. A 14, 1704 (1996). 10.1116/1.580323
7. H. Takatsuji, S. Tsuji, K. Kuroda, and H. Saka, Mater. Trans. 40, 899 (1999).
8. W. J. Lee, Y.-K. Fang, J.-J. Ho, V.-Y. Chen, L.-H. Chiou, S.-J. Wang, F. Dai, T. Hsieh, R.-Y. Tsai, D. Huang, and F. C. Ho, Solid State Electron. 46, 477 (2002). 10.1016/S0038-1101(01)00307-0
9. Z. Ovadyahu, J. Phys. C 19, 5187 (1986). 10.1088/0022-3719/19/26/018
10. J. R. Bellingham, W. A. Phillips, and C. J. Adkins, J. Phys.: Condens. Matter 2, 6207 (1990). 10.1088/0953-8984/2/28/011
11. J. R. Bellingham, M. Graham, C. J. Adkins, and W. A. Phillips, J. Non-Cryst. Solids 137138, 519 (1991). 10.1016/S0022-3093(05)80169-3
12. F. Utsuno, H. Inoue, I. Yasui, Y. Shimane, S. Tomai, S. Matsuzaki, K. Inoue, I. Hirosawa, M. Sato, and T. Honma, Thin Solid Films 496, 95 (2006). 10.1016/j.tsf.2005.08.256
13. F. Utsuno, H. Inoue, I. Yasui, Y. Shimane, T. Shibuya, K. Yano, K. Inoue, I. Hirosawa, M. Sato, and T. Honma, Thin Solid Films 516, 5818 (2008). 10.1016/j.tsf.2007.10.046
14. K. Nomura, T. Kamiya, H. Ohta, T. Uruga, M. Hirano, and H. Hosono, Phys. Rev. B 75, 035212 (2007). 10.1103/PhysRevB.75.035212
15. D.-Y. Cho, J. Song, K. D. Na, C. S. Hwang, J. H. Jeong, J. K. Jeong, and Y.-G. Mo, Appl. Phys. Lett. 94, 112112 (2009). 10.1063/1.3103323
16. Y. S. Jung, J. Y. Seo, D. W. Lee, and D. Y. Jeon, Thin Solid Films 445, 63 (2003). 10.1016/j.tsf.2003.09.014
17. R. Martins, P. Barquinha, A. Pimentel, L. Pereira, and E. Fortunato, Phys. Status Solidi A 202, R95 (2005). 10.1002/pssa.200521020
18. B. Yaglioglu, Y.-J. Huang, H.-Y. Yeom, and D. C. Paine, Thin Solid Films 496, 89 (2006). 10.1016/j.tsf.2005.08.255
19. A. J. Leenheer, J. D. Perkins, M. F. A. M. van Hest, J. J. Berry, R. P. O'Hayre, and D. S. Ginley, Phys. Rev. B 77, 115215 (2008). 10.1103/PhysRevB.77. 115215
20. J. D. Perkins, M. F. A. M. van Hest, M. P. Taylor, and D. S. Ginley, Int. J. Nanotechnol. 6, 850 (2009). 10.1504/IJNT.2009.026744
21. H. Nakazawa, Y. Ito, E. Matsumoto, K. Adachi, N. Aoki, and Y. Ochiai, J. Appl. Phys. 100, 093706 (2006). 10.1063/1.2358829
22. M. Funaki, K. Makise, B. Shinozaki, K. Yano, F. Utsuno, K. Inoue, and H. Nakamura, J. Appl. Phys. 103, 113701 (2008). 10.1063/1.2936316
23. A. Takagi, K. Nomura, H. Ohta, H. Yanagi, T. Kamiya, M. Hirano, and H. Hosono, Thin Solid Films 486, 38 (2005). 10.1016/j.tsf.2004.11.223
24. T. Koida, H. Fujiwara, and M. Kondo, Jpn. J. Appl. Phys. 28, L685 (2007). 10.1143/JJAP.46.L685
25. T. Koida, M. Kondo, K. Tsutsumi, A. Sakaguchi, M. Suzuki, and H. Fujiwara, J. Appl. Phys. 107, 033514 (2010). 10.1063/1.3284960
26. H. Hosono, N. Kikuchi, N. Ueda, and H. Kawazoe, J. Non-Cryst. Solids 198-200, 165 (1996). 10.1016/0022-3093(96)80019-6
27. J. E. Medvedeva, Euro. Phys. Lett. 100, 255501 (2007).
28. J. Robertson, Phys. Status Solidi B 245, 1026 (2008). 10.1002/pssb.200743458
29. T. Kamiya, K. Nomura, M. Hirano, and H. Hosono, Phys. Status Solidi C 5, 3098 (2008). 10.1002/pssc.200779300
30. T. Kamiya, K. Nomura, M. Hirano, and H. Hosono, Phys. Status Solidi A 206, 860 (2009). 10.1002/pssa.200881303
31. A. Walsh, J. L. F. Da Silva, and S.-H. Wei, Chem. Mater. 21, 5119 (2009). 10.1021/cm9020113
32. H. Omura, H. Kumomi, K. Nomura, T. Kamiya, M. Hirano, and H. Hosono, J. Appl. Phys. 105, 093712 (2009). 10.1063/1.3089232
33. J. E. Medvedeva and C. L. Hettiarachchi, Phys. Rev. B 81, 125116 (2010). 10.1103/PhysRevB.81.125116
34. C. G. Van de Walle, Phys. Rev. Lett. 85, 1012 (2000). 10.1103/PhysRevLett.85.1012
35. C. Kilic and A. Zunger, Appl. Phys. Lett. 81, 73 (2002). 10.1063/1.1482783
36. S. Lany and A. Zunger, Phys. Rev. Lett. 98, 045501 (2007). 10.1103/PhysRevLett.98.045501
37. A. Jannotti and C. G. Van de Walle, Phys. Rev. B 76, 165202 (2007). 10.1103/PhysRevB.76.165202
38. T. Kamiya, K. Nomura, and H. Hosono, Phys. Status Solidi A 207, 1698 (2010). 10.1002/pssa.200983772
39. H. Fujiwara and M. Kondo, Phys. Rev. B 71, 075109 (2005). 10.1103/PhysRevB.71.075109
40. R. Clanget, Appl. Phys. 2, 247 (1973). 10.1007/BF00889507
41. Y. Ohhata, F. Shinoki, and S. Yoshida, Thin Solid Films 59, 255 (1979). 10.1016/0040-6090(79)90298-0
42. T. Pisarkiewicz, K. Zakrzewska, and E. Leja, Thin Solid Films 174, 217 (1989). 10.1016/0040-6090(89)90892-4
43. T. Nagatomo, Y. Maruta, and O. Omoto, Thin Solid Films 192, 17 (1990). 10.1016/0040-6090(90)90475-S
44. T. Minami, H. Sato, K. Ohashi, T. Tomofuji, and S. Takata, J. Cryst. Growth, 117, 370 (1992). 10.1016/0022-0248(92)90778-H
45. S. Brehme, F. Fenske, W. Fuhs, E. Nebauer, M. Poschenrieder, B. Selle, and I. Sieber, Thin Solid Films 342, 167 (1999). 10.1016/S0040-6090(98)01490-4
46. D. L. Young, T. J. Coutts, V. I. Kaydanov, A. S. Gilmore, and W. P. Mulligan, J. Vac. Sci. Technol. A 18, 2978 (2000). 10.1116/1.1290372
47. M. Chen, Z. L. Pei, X. Wang, Y. H. Yu, X. H. Liu, C. Sun, and L. S. Wen, J. Phys. D: Appl. Phys. 33, 2538 (2000). 10.1088/0022-3727/33/20/304
48. A. V. Sigh, R. M. Mehra, A. Yoshida, and A. Wakahara, J. Appl. Phys. 95, 3640 (2004). 10.1063/1.1667259