Effect of process parameters on the characteristics of indium tin oxide thin film for flat panel display application

Thin Solid Films

Volumn 302, Issue 1-2, 1997, Pages 25-30

  Lee, Byung Hak ^a   Kim, Iee Gon ^a   Cho, Sung Woo ^a   Lee, Si Hyun ^a  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

Conductivity; Hall effect; Indium oxide; Sputtering

Indexed keywords

CRYSTAL IMPURITIES; CRYSTAL MICROSTRUCTURE; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY OF SOLIDS; HALL EFFECT; INDIUM COMPOUNDS; LATTICE CONSTANTS; MAGNETRON SPUTTERING; THERMAL EFFECTS; THIN FILMS; TIN; X RAY CRYSTALLOGRAPHY;

FLAT PANEL DISPLAYS; INDIUM TIN OXIDE;

CONDUCTIVE FILMS;

EID: 0031163350     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09581-8     Document Type: Article

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