Adsorption behavior of two model airborne organic contaminants on wafer surfaces

Chemical Engineering Journal

Volumn 187, Issue , 2012, Pages 239-247

  Tlili, Sabrine ^a   Gómez Alvarez, Elena ^a   Gligorovski, Sasho ^a   Wortham, Henri ^a  

^a AIX MARSEILLE UNIV   (France)

Author keywords

Adsorption; PTR MS; Silicon surface; Thermo chemistry; XPS

Indexed keywords

ADSORPTION BEHAVIOR; ADSORPTION ENTHALPIES; ADSORPTION PHENOMENA; ADSORPTION PROPERTIES; BONDING ENVIRONMENT; ETHYL ACETATES; FABRICATION PROCESS; ON-WAFER; ORGANIC CONTAMINANT; ORGANIC CONTAMINATION; PHYSICOCHEMICAL PROPERTY; PROPYLENE GLYCOL METHYL ETHER; PTR-MS; REALISTIC CONDITIONS; SEMICONDUCTOR FABRICATION PROCESS; SILICON SURFACE; SILICON WAFER SURFACE; SURFACE ATOMS;

ADSORPTION; CHEMICAL PROPERTIES; CLEAN ROOMS; ETHERS; LABORATORIES; ORGANIC SOLVENTS; VOLATILE ORGANIC COMPOUNDS; WAFER BONDING; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON WAFERS;

EID: 84857795954     PISSN: 13858947     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cej.2012.01.067     Document Type: Article

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