Effects of organic contaminants during metal oxide semiconductor processes

Journal of the Electrochemical Society

Volumn 155, Issue 6, 2008, Pages

  Kim, Kwang Salk ^a,b   Kim, Ja Young ^a   Kang, Hee Bog ^a   Lee, Bo Young ^a,c   Park, Su Moon ^b,c  

^a LG Siltron Inc   (South Korea)

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

^c ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

IMPURITIES; MOS DEVICES; ORGANIC COMPOUNDS; SILICON WAFERS;

ORGANIC CONTAMINANTS; SURFACE ANALYTICAL TECHNIQUES;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 43049116525     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2904453     Document Type: Article

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