Theoretical Study of Molecular Contamination on Silicon Wafers: Kinetics

Journal of the IEST

Volumn 41, Issue 5, 1998, Pages 36-43

  Zhu, Sheng Bai ^a,b  

^a Asyst Technologies Inc   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Activation energy; Adsorption; Contamination; Desoiption; Equilibrium state; Surface kinetics

Indexed keywords

ACTIVATION ENERGY; ADSORPTION; APPROXIMATION THEORY; CONTAMINATION; MASS TRANSFER; MOLECULAR DYNAMICS; SURFACE PROPERTIES;

MOLECULAR CONTAMINATION; SURFACE CONTAMINATION;

SILICON WAFERS;

EID: 0032157544     PISSN: 10984321     EISSN: None     Source Type: Journal    
DOI: 10.17764/jiet.41.5.y28564q840587783     Document Type: Article

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