Adsorption behavior of organic contaminants on a silicon wafer surface

Journal of the Electrochemical Society

Volumn 146, Issue 7, 1999, Pages 2725-2729

  Sugimoto, Fumitoshi ^a   Okamura, Sigeru ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; CLEAN ROOMS; CONTAMINATION; DISSOLUTION; GAS CHROMATOGRAPHY; MASS SPECTROMETRY; SOLVENTS; VOLATILE ORGANIC COMPOUNDS;

BOILING POINT;

SILICON WAFERS;

EID: 0032653036     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1392000     Document Type: Article

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