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Journal of the Electrochemical Society

Volumn 157, Issue 5, 2010, Pages

Humidity and temperature dependences of the adsorption and desorption rates for acetone and xylene on silicon wafer

(5) Tlili, S a Nieto Gligorovski, L I a Temime Rousell, B a Gligorovski, S a Wortham, H a

a AIX MARSEILLE UNIVERSITY (France)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION ENTHALPIES; AMBIENT TEMPERATURES; CLEANING PROCESS; DATA SETS; DESORPTION RATE; DESORPTION RATE CONSTANTS; EXPERIMENTAL SETUP; GAS-PHASE CONCENTRATION; LANGMUIR CONSTANT; RELATIVE HUMIDITIES; TEMPERATURE DEPENDENCE; TEMPERATURE DEPENDENT;

ACETONE; ADSORPTION; AROMATIC HYDROCARBONS; ATMOSPHERIC HUMIDITY; CHEMICAL COMPOUNDS; CHEMICAL PROPERTIES; DESORPTION; INDOOR AIR POLLUTION; MOISTURE; RATE CONSTANTS; SEMICONDUCTING SILICON COMPOUNDS; TEMPERATURE DISTRIBUTION; XYLENE;

SILICON WAFERS;

EID: 77951200013 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.3321964 Document Type: Article

Times cited : (9)

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