Controlled deposition of organic contamination and removal with ozone-based cleanings

Journal of the Electrochemical Society

Volumn 148, Issue 3, 2001, Pages

  Claes, M ^a,b   De Gendt, S ^a,b   Kenens, C ^a,b   Conard, T ^a,b   Bender, H ^a,b   Storm, W ^a,b   Bauer, T ^a,b   Mertens, P ^a,b   Heyns, M M ^a,b  

^a IMEC   (Belgium)

^b SILTRONIC AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0842330351     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1346618     Document Type: Article

References (3)

1. S. De Gendt, M. Knotter, K. Kenis, M. Depas, M. Meuris, P. Mertens, and M. Heyns, Jpn. J. Appl. Phys., 37, 4649 (1998).
2. K. Saga and T. Hattori, J. Electrochem. Soc., 143, 3279 (1996).
3. M. Meuris, P. W. Mertens, A. Opdebeeck, H. F. Schmidt, M. Depas, G. Vereecke, M. M. Heyns, and A. Philiposian, Solid State Technol., 8, 109 (1995).