An approach to determine isopropanol sorption kinetics on wafers by reactor coupled to proton transfer reaction mass spectrometry

Journal of the Electrochemical Society

Volumn 156, Issue 4, 2009, Pages

  Nieto Gligorovski, L I ^a   Gligorovski, S ^a   Tlili, S ^a   Fu, X ^a   Temime Roussel, B ^a   Wortham, H ^a  

^a AIX MARSEILLE UNIVERSITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ANALYTIC EQUIPMENT; ATMOSPHERIC HUMIDITY; CHARGE TRANSFER; CHEMICAL REACTIONS; COUPLED CIRCUITS; DESORPTION; EQUILIBRIUM CONSTANTS; GASES; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; INDOOR AIR POLLUTION; MASS SPECTROMETERS; MASS SPECTROMETRY; OXIDE FILMS; PROTON TRANSFER; PROTONS; RATE CONSTANTS; SEMICONDUCTING SILICON COMPOUNDS; SPECTRUM ANALYSIS;

DESORPTION PROCESS; DESORPTION RATE CONSTANTS; EXPERIMENTAL APPROACHES; FLOW TUBE REACTORS; GAS-PHASE; GAS-PHASE COMPOSITIONS; GAS-PHASE CONCENTRATIONS; ISOPROPANOL; MODEL COMPOUNDS; NATIVE OXIDE FILMS; ON WAFERS; ORGANIC CONTAMINANTS; PRINCIPAL COMPONENTS; PROTON-TRANSFER REACTION MASS SPECTROMETRIES; RELATIVE HUMIDITIES; SORPTION KINETICS;

SILICON WAFERS;

EID: 61349184491     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3079334     Document Type: Article

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