SCOPUS 정보 검색 플랫폼

Volumn 515, Issue , 2012, Pages 149-153

Influence of deposition temperature on structural, optical and electrical properties of sputtered Al doped ZnO thin films

(2) Mosbah, A a,b Aida, M S a

a Universite Mentouri Constantine (Algeria)

b FERHAT ABBAS UNIVERSITY (Algeria)

Author keywords

Al doping; DC sputtering; Electrical properties; Optical properties; Substrate temperature; ZnO

Indexed keywords

AL-DOPING; DC SPUTTERING; ELECTRICAL PROPERTY; SUBSTRATE TEMPERATURE; ZNO;

ALUMINUM; CARRIER CONCENTRATION; CARRIER MOBILITY; DEPOSITION; ELECTRIC PROPERTIES; METALLIC FILMS; OPTICAL FILMS; OPTICAL PROPERTIES; SEMICONDUCTOR DOPING; SILICON OXIDES; SURFACE ROUGHNESS; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

SUBSTRATES;

EID: 84855455043 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2011.11.113 Document Type: Article

Times cited : (71)

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