High optical quality IZO (In2Zn2O5) thin films by PLD - A novel development for III-V opto-electronic devices

Optics Communications

Volumn 262, Issue 1, 2006, Pages 91-96

  Ramamoorthy, K ^a   Kumar, K ^a   Chandramohan, R ^b   Sankaranarayanan, K ^a   Saravanan, R ^c   Kityk, I V ^d   Ramasamy, P ^e  

^a ALAGAPPA UNIVERSITY   (India)

^b Sree Sevugan Annamalai College   (India)

^c NATIONAL INSTITUTE OF TECHNOLOGY   (India)

^d JAN DLUGOSZ UNIVERSITY   (Poland)

^e SSN COLLEGE OF ENGINEERING   (India)

Author keywords

Buffer layer on InP; Laser epitaxy; Semiconducting materials; Solar cells; Thin film structure and morphology

Indexed keywords

FILM GROWTH; OPACITY; PULSED LASER DEPOSITION; SEMICONDUCTOR MATERIALS; SOLAR CELLS; ZINC OXIDE;

BUFFER LAYER ON INP; LASER EPITAXY; THIN FILM STRUCTURE AND MORPHOLOGY;

THIN FILMS;

EID: 33646126695     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optcom.2005.12.042     Document Type: Article

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