ZnO thin films produced by filtered cathodic vacuum arc technique

Ceramics International

Volumn 30, Issue 7, 2004, Pages 1669-1674

  Tse, K Y ^a   Hng, H H ^a   Lau, S P ^b   Wang, Y G ^b   Yu, S F ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

A. Films; B. Electron microscopy; D. ZnO

Indexed keywords

CRYSTALS; DEPOSITION; ELECTRIC ARCS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; ZINC OXIDE;

AXIAL FIELDS; BASE PRESSURE; FILTERED CATHODIC VACUUM ARC (FCVA) TECHNIQUE; INTERDIFFUSION;

THIN FILMS;

EID: 4344624040     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2003.12.156     Document Type: Conference Paper

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