Highly sensitive ultraviolet detector using a ZnO/Si layered SAW oscillator

Thin Solid Films

Volumn 518, Issue 11, 2010, Pages 3059-3062

  Wei, Ching Liang ^a   Chen, Ying Chung ^a   Cheng, Chien Chuan ^b   Kao, Kuo Sheng ^c   Cheng, Da Long ^c   Cheng, Po Shu ^a  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^b DE LIN INSTITUTE OF TECHNOLOGY   (Taiwan)

^c SHU TE UNIVERSITY   (Taiwan)

Author keywords

SAW oscillator; Sensor; UV light detection; ZnO

Indexed keywords

ACTIVE LAYER; FREQUENCY SHIFT; HIGH-ORDER; HIGHLY SENSITIVE; LAYERED SURFACE ACOUSTIC WAVES; MATCHING NETWORKS; MAXIMUM SENSITIVITY; OSCILLATOR CIRCUITS; OUTPUT POWER; PHOTOGENERATED CARRIERS; PIEZOELECTRIC LAYERS; SAW OSCILLATOR; SAW OSCILLATORS; SEM; SURFACE ACOUSTIC WAVES; ULTRA-VIOLET LIGHT; UV DETECTION; UV INTENSITY; UV LIGHT; UV LIGHT DETECTION; ZNO; ZNO FILMS; ZNO THIN FILM;

ACOUSTIC WAVES; ACOUSTICS; ACOUSTOELECTRIC EFFECTS; FREQUENCY SHIFT KEYING; METALLIC FILMS; SCANNING ELECTRON MICROSCOPY; SENSORS; ULTRAVIOLET RADIATION; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

ACOUSTIC SURFACE WAVE DEVICES;

EID: 77649203323     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.07.207     Document Type: Article

References (25)

1. Zheng X.G., Li Q.S., Zhao J.P., Chen D., Zhao B., Yang Y.J., and Zhang L.C. Appl. Surf. Sci. 253 (2006) 2264
2. Nakano M., Makino T., Tsukazaki A., Ueno K., Ohtomo A., Fukumura T., Yuji H., Nishimoto Y., Akasaka S., Takamizu D., Nakahara K., Tanabe T., Kamisawa A., and Kawasaki M. Appl. Phys. Exp. 1 (2008) 121201
3. Nakano M., Makino T., Tsukazaki A., Ueno K., Ohtomo A., Fukumura T., Yuji H., Akasaka S., Tamura K., Nakahara K., Tanabe T., Kamisawa A., and Kawasaki M. Appl. Phys. Lett. 93 (2008) 123309
4. Buff W. IEEE Ultras. Symp. 1 (2002) 435
5. Hoummady M., Campitelli A., and Wlodarski W. Smart Mater. Struc. 6 (1997) 647
6. Drafts B. IEEE Trans. Microwave Theor. Tech. 49 (2001) 795
7. Benes E., Groschl M., Burger W., and Schmid M. Sens. Actuators, A, Phys. 48 (1995) 1
8. Ciplys D., Rimeika R., Shur M.S., Rumyantsev S., Gaska R., Sereika A., Yang J., and Asif Khan M. Appl. Phys. Lett. 80 (2002) 2020
9. Sharma P., and Sreenivas K. Appl. Phys. Lett. 83 (2003) 3617
10. Kumar S. P. Sharma1 and K Sreenivas, Semicond. Sci. Technol. 20 (2005) L27
11. Rotter M., Wixforth A., Ruile W., Bernklau D., and Riechert H. Appl. Phys. Lett. 73 (1998) 2128
12. Ciplys D., Shur M.S., Sereika A., Rimeika R., Gaska R., Fareed Q., Zhang J., Hu X., Lunev A., and Bilenko Yu. Phys. Stat. Sol. 203 (2006) 1834
13. Kumar S., Kim G.H., Sreenivas K., and Tandon R.P. J. Electroceram. 22 (2009) 198
14. Talbi A., Sarry F., Le Brizoual L., Elhakiki M., Elmazria O., and Alnot P. IEEE Ultrason. Symp. 2 (2003) 1338
15. Shiosaki T., Yamamoto T., and Kawabata A. IEEE Ultrason. Symp. 1 (1977) 814
16. Lin R.C., Chen Y.C., and Kao K.S. Appl. Phys. A 89 (2007) 475
17. Hickernell F.S. IEEE Trans. Sonic Ultrason. 32 (1985) 621
18. Akiyama M., Xu C., Nonaka K., Hagio T., Nishimura S., Shobu K., and Watanabe T. J. Mater. Sci. 33 (1998) 2463
19. Water W., and Chu S.Y. Mater. Lett. 55 (2002) 67
20. Sayago I., Aleixandre M., Martinez A., Fernandez M.J., Santos J.P., Gutierrez J., Gracia I., and Horrillo M.C. Synth. Met. 148 (2005) 37
21. Du X.Y., Fu Y.Q., Tan S.C., Luo J.K., Flewitt A.J., Milne W.I., Lee D.S., Park N.M., Park J., Choi Y.J., Kim S.H., and Maeng S. Appl. Phys. Lett. 93 (2008) 094105
22. Le Brizoual L., Sarry F., Elmazria O., Alnot P., Ballandras S., and Pastureaud T. IEEE Trans. Ultrason. Ferroelectr. Freq. Control. 50 (2008) 442
23. Benetti M., Cannat`a D., Di Pietrantonio F., and Verona E. IEEE Trans.Ultrason. Ferroelectr. Freq. Control. 52 (2005) 1806
24. Gorla C.R., Emanetoglu N.W., Liang S., Mayo W.E., Lu Y., Wraback M., and Shen H. J. Appl. Phys. 85 (1999) 2595
25. Emanetoglu N.W., Gorla C., Liu Y., Liang S., and Lu Y. Mater. Sci. Semicond. Process 2 (1999) 247