Studying of transparent conductive ZnO:Al thin films by RF reactive magnetron sputtering

Journal of Crystal Growth

Volumn 211, Issue 1, 2000, Pages 93-97

  Chang, J F ^a   Wang, H L ^a   Hon, M H ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; COATING TECHNIQUES; CONDUCTIVE FILMS; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; ELECTRONIC PROPERTIES; GLASS; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; SILICON WAFERS; TRANSPARENCY; ZINC OXIDE;

COATING PARAMETERS; FRACTIONAL FACTORIAL DESIGN; RF REACTIVE MAGNETRON SPUTTERING; TRANSPARENT CONDUCTIVE;

THIN FILMS;

EID: 0033889468     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(99)00779-4     Document Type: Article

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