Study of interaction between silicon surfaces in dilute ammonia peroxide mixtures (APM) and their components using atomic force microscope (AFM)

Microelectronic Engineering

Volumn 88, Issue 12, 2011, Pages 3442-3447

  Siddiqui, S ^a   Zhang, J ^a   Keswani, M ^a   Fuerst, A ^b   Raghavan, S ^a  

^a University of Arizona   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

Ammonia hydrogen peroxide (APM) mixtures; Contact angle measurements and atomic force microscopy (AFM); Interaction forces; Wafer cleaning

Indexed keywords

ADHESION FORCES; ATOMIC FORCE MICROSCOPES; ATTRACTIVE FORCE; FORCE CURVE; H-TERMINATED SI SURFACES; IMMERSION TIME; INTERACTION FORCES; PEROXIDE MIXTURE; REPULSIVE FORCES; SEPARATION DISTANCES; SILICON SURFACES; WAFER CLEANING;

AMMONIA; ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; HYDROGEN; HYDROGEN PEROXIDE; MIXTURES; OXIDATION; SILICON WAFERS;

ADHESION;

EID: 81855166682     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2010.11.005     Document Type: Article

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