Etch Rate of Silicon and Silicon Dioxide in Ammonia-Peroxide Solutions Measured by Quartz Crystal Microbalance Technique

Electrochemical and Solid-State Letters

Volumn 2, Issue 2-4, 1999, Pages 172-174

  Lee, Kyeong T ^a   Raghavan, Srini ^a  

^a University of Arizona   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM COMPOUNDS; ETCHING; QUARTZ APPLICATIONS; SILICA; SILICON; SOLUTIONS; SPUTTERING;

AMMONIA PEROXIDE; QUARTZ CRYSTAL MICROBALANCE (QCM) TECHNIQUE;

ELECTROCHEMICAL ELECTRODES;

EID: 0033116344     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1390773     Document Type: Article

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