Mechanism of particle deposition on silicon surface during dilute HF cleans

Journal of the Electrochemical Society

Volumn 150, Issue 11, 2003, Pages

  Chen, Zhan ^a,b   Singh, Rajiv K ^a  

^a University of Florida   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; ATOMIC FORCE MICROSCOPY; DEPOSITION; FORCE MEASUREMENT; HYDROFLUORIC ACID; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SURFACE ACTIVE AGENTS; SURFACES; VAN DER WAALS FORCES;

DERJAGUIN-LANDAU-VERWAY-OVERBEEK THEORY; DIRECT SURFACE FORCE MEASUREMENT; LINEAR SUPERPOSITION APPROXIMATION; PARTICLE DEPOSITION; ZETA POTENTIALS;

SURFACE CLEANING;

EID: 0242425789     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1610469     Document Type: Article

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