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Volumn 86, Issue 2, 2009, Pages 132-139
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Megasonic cleaning of wafers in electrolyte solutions: Possible role of electro-acoustic and cavitation effects
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Author keywords
Cavitation; Cleaning; Electro acoustic; Electrolyte; Megasonic; Pressure amplitude; Wafer
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Indexed keywords
ACOUSTICS;
CAVITATION;
CHLORINE COMPOUNDS;
ELECTROACOUSTIC TRANSDUCERS;
ELECTROLYSIS;
ELECTROLYTES;
FOURIER ANALYSIS;
FOURIER TRANSFORMS;
HYDRODYNAMICS;
ORGANIC POLYMERS;
POTASSIUM;
REMOVAL;
SEMICONDUCTING SILICON COMPOUNDS;
SILICA;
SILICON WAFERS;
VAN DER WAALS FORCES;
VIBRATION ANALYSIS;
ACOUSTIC POTENTIALS;
ACOUSTIC PRESSURES;
ADHESION FORCES;
AS MODELS;
CAVITATION EFFECTS;
EFFECT OF IONIC STRENGTHS;
ELECTRO-ACOUSTIC;
ELECTROLYTE SOLUTIONS;
FOURIER TRANSFORMATIONS;
IONIC VIBRATION POTENTIALS;
LOWER POWER DENSITIES;
MEGASONIC;
MEGASONIC CLEANINGS;
PARTICLE REMOVALS;
POTASSIUM CHLORIDES;
POWER DENSITIES;
PRESSURE AMPLITUDE;
PRESSURE DATUMS;
SILICA PARTICLES;
SOUND WAVES;
TIME DEPENDENTS;
TWO TYPES;
VIBRATION POTENTIALS;
WAFER;
IONIC STRENGTH;
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EID: 58149265335
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mee.2008.09.042 Document Type: Article |
Times cited : (42)
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References (24)
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