Effects of the substrate and oxygen partial pressure on the microstructures and optical properties of Ti-doped ZnO thin films

Superlattices and Microstructures

Volumn 50, Issue 6, 2011, Pages 703-712

  Ma, Ligang ^a   Ai, Xiaoqian ^a   Huang, Xinli ^a   Ma, Shuyi ^a  

^a NORTHWEST NORMAL UNIVERSITY   (China)

Author keywords

Microstructure; Optical properties; RF magnetron sputtering; Ti doped ZnO thin films

Indexed keywords

DIFFERENT SUBSTRATES; DIFFRACTION PEAKS; EMISSION PEAKS; FLUORESCENCE SPECTROPHOTOMETER; GLASS SUBSTRATES; HEXAGONAL WURTZITE STRUCTURE; OXYGEN PARTIAL PRESSURE; PHOTOLUMINESCENCE SPECTRUM; PL SPECTRA; POLYCRYSTALLINE; PREFERRED ORIENTATIONS; RADIO FREQUENCY REACTIVE MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; ROOM TEMPERATURE; SI SUBSTRATES; STRUCTURAL AND OPTICAL PROPERTIES; VISIBLE RANGE; ZNO; ZNO THIN FILM;

DIFFRACTION; GLASS; MAGNETRON SPUTTERING; METALLIC FILMS; MICROSTRUCTURE; OPTICAL FILMS; OXYGEN; PARTIAL PRESSURE; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE; ZINC SULFIDE;

OPTICAL PROPERTIES;

EID: 80955132253     PISSN: 07496036     EISSN: 10963677     Source Type: Journal    
DOI: 10.1016/j.spmi.2011.09.012     Document Type: Article

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