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Volumn 42, Issue 5, 2010, Pages 1487-1491
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Structural and optical properties of ZnO:Mg thin films grown under different oxygen partial pressures
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Author keywords
Optical properties; RF magnetron sputtering; X ray diffraction; ZnO:Mg thin films
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Indexed keywords
CRYSTAL QUALITIES;
DOPED ZNO;
FLUORESCENCE SPECTROPHOTOMETER;
GRAIN ORIENTATION;
GREEN EMISSIONS;
MG FILMS;
MG THIN FILMS;
MG-DOPED;
MG-DOPING;
OPTICAL BANDS;
OXYGEN PARTIAL PRESSURE;
PHOTOLUMINESCENCE MEASUREMENTS;
RF REACTIVE MAGNETRON SPUTTERING;
RF-MAGNETRON SPUTTERING;
ROOM TEMPERATURE;
SCANNING ELECTRONIC MICROSCOPY;
SEM;
SHORTER WAVELENGTH;
STRUCTURAL AND OPTICAL PROPERTIES;
ZNO;
DIFFRACTION;
DOPING (ADDITIVES);
MAGNESIUM PRINTING PLATES;
MAGNETRON SPUTTERING;
MAGNETRONS;
OPTICAL PROPERTIES;
OXIDE FILMS;
OXYGEN;
PARTIAL PRESSURE;
THIN FILMS;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
ZINC;
ZINC OXIDE;
OPTICAL FILMS;
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EID: 77349084635
PISSN: 13869477
EISSN: None
Source Type: Journal
DOI: 10.1016/j.physe.2009.12.005 Document Type: Article |
Times cited : (59)
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References (30)
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