Structure and optical properties of ZnO:V thin films with different doping concentrations

Thin Solid Films

Volumn 517, Issue 13, 2009, Pages 3721-3725

  Wang, Liwei ^a,b,c   Meng, Lijian ^a,b   Teixeira, Vasco ^b   Song, Shigeng ^d   Xu, Zheng ^c   Xu, Xurong ^c  

^a INSTITUTO SUPERIOR DE ENGENHARIA DO PORTO   (Portugal)

^b UNIVERSITY OF MINHO   (Portugal)

^c BEIJING JIAOTONG UNIVERSITY   (China)

^d UNIVERSITY OF THE WEST OF SCOTLAND   (United Kingdom)

Author keywords

Magnetron sputtering; Optical properties; V doped ZnO

Indexed keywords

AS DOPING; C-AXIS ORIENTATIONS; DIFFRACTION PEAKS; DIRECT CURRENTS; DOPING CONCENTRATIONS; EXTINCTION CO-EFFICIENT; GLASS SUBSTRATES; GRAIN SIZES; OPTICAL BAND-GAP; REACTIVE MAGNETRON SPUTTERING; SEM; V-DOPED ZNO; VANADIUM CONCENTRATIONS; WURTZITE STRUCTURES; X-RAY DIFFRACTIONS; XRD; ZNO; ZNO THIN FILMS;

CONCENTRATION (PROCESS); DIFFRACTION; MAGNETRONS; OPTICAL CONSTANTS; REFRACTIVE INDEX; SEMICONDUCTING ZINC COMPOUNDS; THIN FILMS; TRANSITION METALS; VANADIUM; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE; ZINC SULFIDE;

DOPING (ADDITIVES);

EID: 64449088648     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.12.043     Document Type: Article

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