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Volumn 481, Issue 1-2, 2009, Pages 802-805
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Effect of Li-doped concentration on the structure, optical and electrical properties of p-type ZnO thin films prepared by sol-gel method
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Author keywords
Electrical property; Optical property; Sol gel; Structure; ZnO thin film
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Indexed keywords
DEEP LEVEL EMISSION;
DOPED ZNO;
DOPING CONCENTRATION;
ELECTRICAL CONDUCTIVITY;
ELECTRICAL PROPERTY;
ELECTRICAL RESISTIVITY;
HALL MEASUREMENTS;
NEAR ULTRAVIOLET;
OPTICAL AND ELECTRICAL PROPERTIES;
P TYPE ZNO THIN FILM;
P-TYPE;
PHOTOLUMINESCENCE SPECTRUM;
POLYCRYSTALLINE WURTZITE;
PREFERRED ORIENTATIONS;
ROOM TEMPERATURE;
SEM;
SI(1 0 0);
SOL-GEL METHODS;
STRUCTURE;
VISIBLE REGION;
ZNO THIN FILM;
CONCENTRATION (PROCESS);
DOPING (ADDITIVES);
ELECTRIC CONDUCTIVITY;
ELECTRIC RESISTANCE;
EMISSION SPECTROSCOPY;
GALVANOMAGNETIC EFFECTS;
GELATION;
GELS;
HALL MOBILITY;
HOLE CONCENTRATION;
LIGHT;
METALLIC FILMS;
OPTICAL FILMS;
OPTICAL PROPERTIES;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING SILICON COMPOUNDS;
SEMICONDUCTING ZINC COMPOUNDS;
SOL-GEL PROCESS;
SOL-GELS;
SOLS;
THIN FILM DEVICES;
THIN FILMS;
X RAY DIFFRACTION;
ZINC OXIDE;
ZINC SULFIDE;
STRUCTURAL PROPERTIES;
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EID: 67649283805
PISSN: 09258388
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jallcom.2009.03.111 Document Type: Article |
Times cited : (90)
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References (21)
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