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Volumn 255, Issue 9, 2009, Pages 4848-4851
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The effect of substrate material on pulsed laser deposition of HgCdTe films
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Author keywords
Different substrates; HgCdTe thin film; PLD
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
ELECTRON DIFFRACTION;
ENERGY DISPERSIVE SPECTROSCOPY;
EPITAXIAL GROWTH;
GALLIUM ARSENIDE;
II-VI SEMICONDUCTORS;
III-V SEMICONDUCTORS;
PULSED LASER DEPOSITION;
PULSED LASERS;
SAPPHIRE;
SEMICONDUCTING GALLIUM;
SEMICONDUCTOR ALLOYS;
SUBSTRATES;
X RAY DIFFRACTION;
DIFFERENT SUBSTRATES;
ENERGY DISPERSIVE X RAY SPECTROSCOPY;
EPITAXIAL THIN FILMS;
HGCDTE;
SAPPHIRE SUBSTRATES;
SELECTED AREA ELECTRON DIFFRACTION;
STRUCTURE AND PROPERTIES;
SUBSTRATE MATERIAL;
THIN FILMS;
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EID: 60249094437
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/j.apsusc.2008.12.015 Document Type: Article |
Times cited : (12)
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References (13)
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