SCOPUS 정보 검색 플랫폼

Volumn 46, Issue 11, 2011, Pages 1975-1979

Effect of oxygen flow rate and radio-frequency power on the photoconductivity of highly ultraviolet sensitive ZnO thin films grown by magnetron sputtering

(2) Ghosh, T a Basak, D a

a DEPARTMENT OF MATERIALS SCIENCE (India)

Author keywords

A. Oxides; A. Thin films; B. Electrical properties; B. Sputtering; D. Defects

Indexed keywords

CURRENT RATIOS; EFFECT OF OXYGEN; ELECTRICAL MEASUREMENT; OXYGEN CONTENT; OXYGEN FLOW RATES; PHOTOCURRENT SPECTRUM; RADIO FREQUENCY POWER; RF-POWER; SENSITIVE FILMS; STRUCTURAL QUALITIES; VISIBLE AND ULTRAVIOLET; ZNO THIN FILM;

CARRIER CONCENTRATION; CONDUCTIVE FILMS; DEFECTS; ELECTRIC PROPERTIES; FLOW RATE; METALLIC FILMS; OPTICAL FILMS; OXYGEN; PHOTOCONDUCTIVITY; THIN FILMS; ZINC OXIDE;

OXYGEN VACANCIES;

EID: 80052832219 PISSN: 00255408 EISSN: None Source Type: Journal
DOI: 10.1016/j.materresbull.2011.07.019 Document Type: Article

Times cited : (15)

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