Microstructure and properties of Cu-doped ZnO films prepared by dc reactive magnetron sputtering

Journal of Physics D: Applied Physics

Volumn 38, Issue 22, 2005, Pages 4104-4108

  Wang, X B ^a   Li, D M ^a   Zeng, F ^a   Pan, F ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER COMPOUNDS; DIAMONDS; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; INSERTION LOSSES; PHOTOELECTRON SPECTROSCOPY; PIEZOELECTRIC MATERIALS; ZINC OXIDE;

ACOUSTIC WAVE DEVICES; COMPRESSIONAL FORCE; PIEZOELECTRIC CONSTANT; ZNO FILMS;

THIN FILMS;

EID: 27844532514     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/38/22/014     Document Type: Article

References (23)

1. Koike K, Tanaka H and Ieki H 1995 Japan. J. Appl. Phys. 34 2678
2. Kobayashi Y, Tanaka N, Okano H, Usuki T, Shibata K and Shimizu Y 1997 Japan. J. Appl. Phys. 36 6083
3. Kaneshiro C, Suda T, Aoki Y, Hong C, Koh H and Hohkawa K 2000 Japan. J. Appl. Phys. 39 3004
4. Whitfield M D, Audic B, Flannery C M, Kehoe L P, Crean G M and Jackman R B 1999 Diam. Relat. Mater. 8 732
5. Nakahata H, Hachigo A, Higaki K, Fuhii S, Shikata S and Fujimori N 1995 IEEE Trans. UFFC 42 362
6. Assouar M B, Benedic F, Elmazria O, Belmahi M and Roiboo R J 2001 Diam. Relat. Mater. 10 681
7. Igasaki Y, Naika T, Murakami K and Tomoda W 2001 Appl. Surf. Sci. 169 512
8. Kamalasanan M N and Chandra S 1996 Thin Solid Films 288 112
9. Paraguay F D, Estrada W L, Acosta D R N, Andrade E and Miki-Yoshida M 1999 Thin Solid Films 350 192
10. Nakamura K, Shoji T and Kang H B 2000 Japan. J. Appl. Phys. 39 L534
11. Minami T, Sonohara H, Takata S and Sato H 1994 Japan. J. Appl. Phys. 33 L743
12. Wang X Q, Du G T, Gu C Z, Jia J K, Li S J, Yan F W, Liu D L, Yang S R and Ong H C 2002 J. Phys. D: Appl. Phys. 35 L74
13. Maniv S and Zangvil A 1978 J. Appl. Phys. 49 2787
14. Wu M S, Shih W C and Tsai W H 1998 J. Phys. D: Appl. Phys. 31 943
15. Chu S Y, Chen T Y and Water W 2003 J. Cryst. Growth 257 280
16. Sundaram K B, Seidman A and Yassin A 1987 Thin Solid Films 150 291
17. Ellmer K 2000 J. Phys. D: Appl. Phys. 33 R17
18. Chen J J, Gao Y, Zeng F, Li D M and Pan F 2004 Appl. Surf. Sci. 223 318
19. Hartmann A, Puchert M K and Lamb R N 1996 Surf. Interface Anal. 24 671
20. Chen J J, Zeng F, Li D M, Niu J B and Pan F 2005 Thin Solid Films 485 257
21. Liu J M, Pan B, Chan H L W, Zhu S N, Zhu Y Y and Liu Z G 2002 Mater. Chem. Phys. 75 12
22. Shan F K, Kim B I, Liu G X, Liu Z F, Sohn J Y, Lee W J, Shin B C and Yu Y S 2004 J. Appl. Phys. 95 4772
23. Cebulla R, Wendt R and Ellmer K 1998 J. Appl. Phys. 83 1087