Effects of substrate on the structure and orientation of ZnO thin film grown by rf-magnetron sputtering

Journal of Applied Physics

Volumn 102, Issue 8, 2007, Pages

  Liu, H F ^a   Chua, S J ^a   Hu, G X ^b   Gong, H ^b   Xiang, N ^b  

^a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

MOLECULAR STRUCTURE; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTALS; SPUTTERING; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

NOMARSKI MICROSCOPY; POLYCRYSTALLINE STRUCTURE;

SUBSTRATES;

EID: 35648931433     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2798868     Document Type: Article

References (18)

1. Ü. Özgür, Ya. I. Alivov, C. Liu, A. Teke, M. A. Reshchikov, S. Doǧan, V. Avrutin, S.-J. Cho, and H. Morko̧, J. Appl. Phys. 98, 041301 (2005).
2. S. Bethke, H. Pan, and B. W. Wessels, Appl. Phys. Lett. 52, 138 (1988).
3. J. Y. Bae, J. Yoo, and G.-C. Yi, Appl. Phys. Lett. 89, 173114 (2006).
4. A. Ohtomo, M. Kawasaki, Y. Sakurai, Y. Yoshida, H. Koinuma, D. Yu, Z. K. Tung, G. K. L. Wang, and Y. Segawa, Mater. Sci. Eng., B 54, 24 (1998).
5. A. Setiawan, Z. Vashaei, M. W. Cho, T. Yao, H. Kato, M. Sano, K. Miyamoto, I. Yonenaga, and H. Ju Ko, J. Appl. Phys. 96, 3763 (2004).
6. F. K. Shan, G. X. Liu, W. J. Lee, and B. C. Shin, J. Appl. Phys. 101, 053106 (2007).
7. E. M. Kaidashev, M. Lorenz, H. von Wenckstern, A. Rahm, H.-C. Semmelhack, K.-H. Han, G. Benndorf, C. Bundesmann, H. Hochmuth, and M. Grundmann, Appl. Phys. Lett. 82, 3901 (2003).
8. K.-K. Kim, J.-H. Song, H.-J. Jung, W.-K. Choi, S.-J. Park, and J.-H. Song, J. Appl. Phys. 87, 3573 (2000).
9. S. Tüzemen, E. Gür, T. Yldrm, G. Xiongb, and R. T. Williams, J. Appl. Phys. 100, 103513 (2006).
10. T. Steiner, Semiconductor Nanostructures for Optoelectronic Applications (Artech House, Norwood, MA, 2004), p. 33.
11. P. Kuppusami, G. Vollweiler, D. Rafaja, and K. Ellmer, Appl. Phys. A: Mater. Sci. Process. 80, 183 (2005).
12. Ü. Özgür, A. Teke, C. Liu, S.-J. Cho, H. Morko̧, and H. O. Everitt, Appl. Phys. Lett. 84, 3223 (2004).
13. M. D. Craven, S. H. Lim, J. S. Speck, and S. P. DenBaars, Appl. Phys. Lett. 0003-6951 10.1063/1.1493220 81, 469 (2002); F. Wu, M. D. Craven, S. H. Lim, and J. S. Speck, J. Appl. Phys. 94, 942 (2003).
14. M. D. Craven, S. H. Lim, J. S. Speck, and S. P. DenBaars, Appl. Phys. Lett. 0003-6951 10.1063/1.1493220 81, 469 (2002); F. Wu, M. D. Craven, S. H. Lim, and J. S. Speck, J. Appl. Phys. 94, 942 (2003).
15. C. R. Eddy, Jr., T. D. Moustakas, and J. Scanlon, J. Appl. Phys. 73, 448 (1993).
16. P. P. Paskov, R. Schifano, B. Monemar, T. Paskova, S. Figge, and D. Hommel, J. Appl. Phys. 98, 093519 (2005).
17. X. H. Wu, C. R. Elsass, A. Abare, M. Mack, S. Keller, P. M. Petroff, S. P. DenBaars, J. S. Speck, and S. J. Rosner, Appl. Phys. Lett. 72, 692 (1998).
18. Y. Zhang, G. Du, H. Zhu, C. Hou, K. Huang, and S. Yang, Opt. Mater. (Amsterdam, Neth.) 27, 399 (2004).