Effect of oxygen gas pressure on electrical, optical, and structural properties of Al-doped ZnO thin films fabricated by pulsed laser deposition for use as transparent electrodes in all-solid-state electrochromic devices

Japanese Journal of Applied Physics

Volumn 50, Issue 8 PART 2, 2011, Pages

  Ohshima, Tamiko ^a   Murakami, Yuuki ^a   Kawasaki, Hiroharu ^a   Suda, Yoshiaki ^a   Yagyu, Yoshihito ^a  

^a SASEBO NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AL-DOPED ZNO; ALL-SOLID-STATE; AMBIENT OXYGEN; AZO FILMS; AZO THIN FILMS; DIFFRACTION ANGLE; EFFECT OF OXYGEN; OXYGEN GAS PRESSURE; PREFERRED ORIENTATIONS; ROOM TEMPERATURE; TRANSPARENT ELECTRODE; VISIBLE REGION;

ALUMINUM; CARRIER CONCENTRATION; DIFFRACTION; ELECTRIC PROPERTIES; OPTICAL FILMS; OXYGEN; PRESSURE EFFECTS; PULSED LASER DEPOSITION; PULSED LASERS; SOLID STATE DEVICES; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; ZINC OXIDE;

DEPOSITION;

EID: 80052003978     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.50.08JD09     Document Type: Conference Paper

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