Undoped and Al-doped ZnO films with tuned properties grown by pulsed laser deposition

Thin Solid Films

Volumn 516, Issue 22, 2008, Pages 8141-8145

  Papadopoulou, E L ^a,b,d   Varda, M ^b,d   Kouroupis Agalou, K ^b,d   Androulidaki, M ^a,d   Chikoidze, E ^c,d   Galtier, P ^c,d   Huyberechts, G ^c,d   Aperathitis, E ^a,d  

^a INSTITUTE OF ELECTRONIC STRUCTURE AND LASER   (Greece)

^b UNIVERSITY OF CRETE   (Greece)

^c Centre National de la Recherche Scientifique   (France)

^d UMICORE   (Belgium)

Author keywords

Electrical properties; Optical properties; PLD; XRD; ZnO

Indexed keywords

ALUMINUM; LASERS; NONMETALS; OXYGEN; PULSED LASER APPLICATIONS; SEMICONDUCTING ZINC COMPOUNDS; THICK FILMS; ZINC ALLOYS; ZINC OXIDE;

AL-DOPED ZNO; ELECTRICAL PROPERTIES; OPTICAL PROPERTIES; PARTIAL OXYGEN PRESSURES; PLD; PULSED LASER DEPOSITION (PLD); PURE ZNO; THIN FILMS; WIDE TEMPERATURE RANGE; XRD; ZNO;

PULSED LASER DEPOSITION;

EID: 50649096377     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.04.022     Document Type: Article

References (21)

1. Hartangel H.L., Dawar A.L., Jain A.K., and Jagadish C. Semiconducting Transparent Thin Films (1995), Institute of Physics Publishing, Bristol and Philadelphia
2. Park S.-M., Ikegami T., Ebihara K., and Shin P.-K. Appl. Surf. Sci. 253 (2006) 1522
3. Yakuphanoglu F., Caglan Y., Ilican S., and Caglar M. Phys., B 394 (2007) 86
4. Sato H., Minami T., Miyata T., Takata S., and Ishii M. Thin Solid Films 246 (1994) 6
5. Hu J., and Gordon R.G. J. Appl. Phys. 71 (1992) 880
6. Mimami T., Oohashi K., Takata S., Mouri T., and Ogawa N. Thin Solid Films 193-194 (1990) 721
7. Igasaki Y., and Saito H. J. Appl. Phys. 70 (1991) 3613
8. Hiramatsu M., Imaeda K., Horio N., and Nawata M. J. Vac. Sci. Technol., A 16 (1998) 669
9. Kim H., Gilmore C.M., Horowitz J.S., Pique A., Murata H., Kushto G.P., Schlaf R., Kafafi Z.H., and Chrisey D.B. Appl. Phys. Lett. 76 (2000) 256
10. Kim H., Horwitz J.S., Qadri S.B., and Chrisey D.B. Thin Solid Films 420-421 (2002) 107
11. Shan F.K., Liu G., Lee W.J., and Shin B.C. J. Appl. Phys. 101 (2007) 053106
12. Klini A., Manousaki A., Anglos D., and Fotakis C. J. Appl. Phys. 98 (2005) 123301
13. Berstein E. Phys. Rev. B 93 (1954) 632
14. Moss T.S. Proc. Phys. Soc. Lond. B 67 (1954) 775
15. Sernelius B.E., Berggren K.F., Jin Z.C., Hsmberg L., and Granqvist G. Phys. Rev. B 37 (1988) 10244
16. Shan F.K., and Yu Y.S. J. Eur. Ceram. Soc. 24 (2004) 1869
17. Liu Y., Zhao L., and Lian J. Vacuum 81 (2006) 118
18. Mass J., Bhattacharya P., and Katiyar R.S. Mat. Sci. Eng., B 103 (2003) 9
19. Kumar M., Mehra R.M., Wakahara A., Ishiba M., and Yoshida A. Thin Solid Films 484 (2005) 174
20. Liu Y., and Lian J. Appl. Surf. Sci. 253 (2007) 3727
21. Horwat D., and Billard A. Thin Solid Films 515 (2007) 5444