Low-temperature growth of low-resistivity indium-tin-oxide thin films by pulsed laser deposition

Vacuum

Volumn 59, Issue 2-3, 2000, Pages 641-648

  Adurodija, F O ^a   Izumi, H ^a   Ishihara, T ^a   Yoshioka, H ^a   Matsui, H ^a   Motoyama, M ^a  

^a Hyogo Prefectural Institute of Industrial Research Technical Center for Machinery and Metals   (Japan)

Author keywords

Electrical properties; Indium tin oxide; Optical properties; Pulsed laser deposition (PLD); Structural properties

Indexed keywords

EID: 0000754701     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(00)00328-6     Document Type: Article

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