Effects of atomic oxygen treatment on structures, morphologies and electrical properties of ZnO:Al films

Applied Surface Science

Volumn 256, Issue 14, 2010, Pages 4527-4532

  Wang, Wenwen ^a   Li, Chunzhi ^a   Zhang, Junying ^a   Diao, Xungang ^a  

^a BEIHANG UNIVERSITY   (China)

Author keywords

Atomic oxygen; Electrical properties; Morphologies; Surface structure; ZnO:Al film

Indexed keywords

ATOMIC FORCE MICROSCOPY; CONDUCTIVE FILMS; ELECTRIC PROPERTIES; EROSION; II-VI SEMICONDUCTORS; METALLIC FILMS; MORPHOLOGY; OXYGEN; SCANNING ELECTRON MICROSCOPY; SURFACE STRUCTURE; X RAY DIFFRACTION; ZINC OXIDE;

ATOMIC OXYGEN; ATOMIC OXYGEN TREATMENT; CONDUCTIVE PROPERTIES; DIRECT-CURRENT MAGNETRONS; GROUND BASED SIMULATION; SURFACE CHEMICAL STATE; SURFACE PARTICLES; ZNO:AL FILMS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 77950595263     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.02.041     Document Type: Article

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