Characteristics of tungsten oxide thin films prepared on the flexible substrates using pulsed laser deposition

Thin Solid Films

Volumn 516, Issue 13, 2008, Pages 4397-4401

  Suda, Yoshiaki ^a   Kawasaki, Hiroharu ^a   Ohshima, Tamiko ^a   Yagyuu, Yoshihito ^a  

^a SASEBO NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

Electrochromic; Plasma process; Pulsed laser deposition; Tungsten trioxide

Indexed keywords

ELECTROCHROMISM; FILM PREPARATION; INDIUM COMPOUNDS; MIXTURES; OXYGEN; PULSED LASER DEPOSITION; TIN COMPOUNDS; TUNGSTEN COMPOUNDS;

COLOR CHANGE; ELECTROCHROMIC PROPERTIES; FLEXIBLE SUBSTRATES; OXYGEN GAS MIXTURES;

THIN FILMS;

EID: 41549150242     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.10.023     Document Type: Article

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