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Volumn 517, Issue 8, 2009, Pages 2596-2601
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Indium tin oxide films deposited on polyethylene naphthalate substrates by radio frequency magnetron sputtering
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Author keywords
Electrical properties and measurements; Indium tin oxide; Optical properties; Sputtering; Structural properties; X ray diffraction
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Indexed keywords
CARRIER CONCENTRATION;
CHEMICAL VAPOR DEPOSITION;
CRYSTALLINE MATERIALS;
DIFFRACTION;
ELECTRIC PROPERTIES;
ELECTRIC RESISTANCE;
ELECTRODEPOSITION;
INDIUM;
LIGHT TRANSMISSION;
MAGNETRONS;
OPTICAL PROPERTIES;
ORGANIC LIGHT EMITTING DIODES (OLED);
OXIDE FILMS;
PHOTOLITHOGRAPHY;
PLASMA DEPOSITION;
SUBSTRATES;
THERMOPLASTICS;
TIN;
TITANIUM COMPOUNDS;
X RAY ANALYSIS;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
CRYSTALLINE ORIENTATIONS;
CUBIC CRYSTALLINE;
DEPOSITION PROCESS;
DEPOSITION TIME;
ELECTRICAL AND OPTICAL PROPERTIES;
ELECTRICAL PROPERTIES AND MEASUREMENTS;
ELECTRICAL RESISTIVITIES;
HALL MEASUREMENTS;
INDIUM TIN OXIDE;
INDIUM TIN OXIDE FILMS;
INDIUM TIN OXIDE THIN FILMS;
ITO FILMS;
OPTICAL TRANSMISSION MEASUREMENTS;
OPTICAL TRANSMISSIONS;
PLASTIC SUBSTRATES;
POLY-CRYSTALLINE;
POLYETHYLENE NAPHTHALATE;
RADIO FREQUENCY MAGNETRON SPUTTERING;
RF-POWER;
SPUTTERING;
SPUTTERING PROCESS;
STRUCTURAL PROPERTIES;
VAN DER PAUW METHODS;
X-RAY DIFFRACTION MEASUREMENTS;
OPTICAL FILMS;
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EID: 59149094044
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2008.10.016 Document Type: Article |
Times cited : (27)
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References (41)
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